The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2012

Filed:

Jan. 21, 2011
Applicants:

Yao-hung Yang, Santa Clara, CA (US);

Abhijit Kangude, Santa Clara, CA (US);

Sanjeev Baluja, Campbell, CA (US);

Michael Martinelli, Santa Clara, CA (US);

Liliya Krivulina, Sunnyvale, CA (US);

Thomas Nowak, Cupertino, CA (US);

Juan Carlos Rocha-alvarez, San Carlos, CA (US);

Scott Hendrickson, Brentwood, CA (US);

Inventors:

Yao-Hung Yang, Santa Clara, CA (US);

Abhijit Kangude, Santa Clara, CA (US);

Sanjeev Baluja, Campbell, CA (US);

Michael Martinelli, Santa Clara, CA (US);

Liliya Krivulina, Sunnyvale, CA (US);

Thomas Nowak, Cupertino, CA (US);

Juan Carlos Rocha-Alvarez, San Carlos, CA (US);

Scott Hendrickson, Brentwood, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.


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