Wuhan, China

Lichuan Zhao

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Yangtze Memory Technologies Co., Ltd.. Active years: 2022-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lichuan Zhao. Retrieved from https://idiyas.com/inventor/lichuan-zhao-jbl74405

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

Title: Lichuan Zhao: Innovator in Memory Device Technology

Introduction

Lichuan Zhao is a prominent inventor based in Wuhan, China. He has made significant contributions to the field of memory device technology, holding a total of 4 patents. His work focuses on enhancing the performance and efficiency of memory devices through innovative circuit designs.

Latest Patents

One of Lichuan Zhao's latest patents is titled "Complementary metal oxide semiconductor circuit of memory device." This invention features a complementary metal oxide semiconductor (CMOS) circuit that includes a high-voltage functional circuit and an auxiliary clamping circuit. The high-voltage functional circuit comprises at least one MOS transistor, with one of its source or drain terminals connected to an input high-voltage. The output voltage of this circuit gradually increases to a maximum value when an enable signal is valid. The auxiliary clamping circuit is designed to clamp the voltage input to the MOS transistor during the rising phase of the output voltage, ensuring that the clamping voltage remains lower than the input high-voltage.

Another notable patent is "Three-dimensional memory devices with drain select gate cut and methods for forming and operating the same." This invention describes a 3D memory device that includes a memory stack, multiple memory strings, and bit line contacts. The memory stack consists of interleaved conductive and dielectric layers, with each memory string extending vertically through the stack. The conductive layers feature drain select gate (DSG) lines that control the drains of the memory strings, which are organized into regions that represent the minimum repeating unit of the memory stack.

Career Highlights

Lichuan Zhao is currently employed at Yangtze Memory Technologies Co., Ltd., where he continues to push the boundaries of memory technology. His innovative designs and patents have positioned him as a key player in the industry, contributing to advancements in memory device performance.

Collaborations

Throughout his career, Lichuan has collaborated with talented individuals such as Yuhui Han and Wenxi Zhou. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Lichuan Zhao's contributions to memory device technology through his patents and innovative designs highlight his role as a leading inventor in the field. His work continues to influence advancements in memory technology, showcasing the importance of innovation in this rapidly evolving industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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