This inventor holds 10 USPTO granted patents. Top assignee: Nan Ya Technology Corporation. Active years: 2006-2025.
Location History:
- Taipei Hsien, TW (2006)
- New Taipei, TW (2021 - 2023)
Company Filing History:
Years Active: 2006-2025
Title: Innovations of Inventor Li-Han Lu
Introduction
Li-Han Lu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on innovative methods for preparing semiconductor devices, which are crucial for modern electronics.
Latest Patents
Li-Han Lu's latest patents include a method for preparing a semiconductor device structure with energy removable spacers. This method involves forming a target layer over a semiconductor substrate and creating a plurality of first mask patterns. It also includes the formation of energy removable spacers on the sidewalls of these patterns, followed by the etching of the target layer using the mask patterns. Another notable patent is for a semiconductor device with a composite gate dielectric. This device features a word line structure that includes a composite gate dielectric and a graphene layer, enhancing its performance and efficiency.
Career Highlights
Li-Han Lu is currently employed at Nan Ya Technology Corporation, where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry, driving advancements that benefit various electronic applications.
Collaborations
Li-Han Lu has collaborated with several talented individuals, including Yinan Chen and Ping Cheng Hsu. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Li-Han Lu's work exemplifies the spirit of innovation in the semiconductor industry. His patents and contributions continue to shape the future of technology, making him a noteworthy inventor in his field.