The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2024

Filed:

Feb. 14, 2022
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventor:

Li-Han Lu, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01); H01L 29/08 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H10B 12/30 (2023.02); H01L 29/0847 (2013.01); H01L 29/1606 (2013.01);
Abstract

A semiconductor device includes a first source/drain region and a second source/drain region disposed in a semiconductor substrate. The semiconductor device also includes a word line structure disposed in the semiconductor substrate and between the first source/drain region and the second source/drain region. The word line structure includes a composite gate dielectric, and a lower electrode layer disposed over the composite gate dielectric. The word line structure also includes an upper electrode layer disposed over the lower electrode layer, and a graphene layer disposed between the lower electrode layer and the upper electrode layer. The composite gate dielectric includes a gate dielectric layer and a protection liner.


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