Company Filing History:

9 out of 916

Varian Semiconductor Equipment Associates, Inc.

patents

4 out of 777

Varian Associates, Inc.

patents

Years Active: 1986-2015

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9076625 - Indirectly heated cathode cartridge design (2015-07-07),

2. 8455839 - Cleaning of an extraction aperture of an ion source (2013-06-04),

3. 8071956 - Cleaning of an extraction aperture of an ion source (2011-12-06),

4. 8049192 - Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter (2011-11-01),

5. 7491947 - Technique for improving performance and extending lifetime of indirectly heated cathode ion source (2009-02-17),

6. 7276847 - Cathode assembly for indirectly heated cathode ion source (2007-10-02),

7. 7138768 - Indirectly heated cathode ion source (2006-11-21),

8. 7102139 - Source arc chamber for ion implanter having repeller electrode mounted to external insulator (2006-09-05),

9. 6448567 - Method and apparatus for shielding a valve gate and other valve parts (2002-09-10),

10. 5629528 - Charged particle beam system having beam-defining slit formed by (1997-05-13),

11. 4931776 - Fluid flow sensor with flexible vane (1990-06-05),

12. 4744709 - Low deflection force sensitive pick (1988-05-17),

13. 4602713 - Multiple wafer holder for a wafer transfer system (1986-07-29),

Title: The Innovative Contributions of Leo Klos

Introduction

Leo Klos is a notable inventor based in Newburyport, MA (US). He has made significant contributions to the field of technology, particularly in the design and functionality of plasma flood guns and ion sources. With a total of 13 patents to his name, Klos has demonstrated a commitment to innovation and excellence in his work.

Latest Patents

One of Klos's latest patents is the indirectly heated cathode cartridge design. This invention provides an apparatus and method for producing electrons in a plasma flood gun. The apparatus features an indirectly heated cathode (IHC) contained within a pre-fabricated cartridge, which can be easily replaced in a plasma flood gun. The use of an IHC significantly reduces the amount of contaminants injected into the workpiece or wafer, enhancing the overall efficiency of the process. Another notable patent involves the cleaning of an extraction aperture of an ion source. This invention includes an arc chamber housing that defines an arc chamber with an extraction aperture and a wiper. The wiper is designed to be positioned within the arc chamber in a parked position and can be driven to operational positions to clean the extraction aperture effectively.

Career Highlights

Throughout his career, Leo Klos has worked with prominent companies such as Varian Semiconductor Equipment Associates, Inc. and Varian Associates, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.

Collaborations

Klos has collaborated with several talented individuals, including Joseph C. Olson and Craig Richard Chaney. These partnerships have fostered a creative environment that has led to innovative solutions and advancements in their respective fields.

Conclusion

Leo Klos's contributions to technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence the industry, paving the way for future innovations.

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