The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Apr. 08, 2011
Applicants:
Craig Chaney, Lanesville, MA (US);
Leo Klos, Newburyport, MA (US);
Anthony Renau, West Newbury, MA (US);
Alexander Perel, Danvers, MA (US);
Inventors:
Craig Chaney, Lanesville, MA (US);
Leo Klos, Newburyport, MA (US);
Anthony Renau, West Newbury, MA (US);
Alexander Perel, Danvers, MA (US);
Assignee:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 9/02 (2006.01); H01J 37/067 (2006.01); H01J 19/20 (2006.01); H01J 29/48 (2006.01); H01J 19/14 (2006.01); H01J 37/02 (2006.01); H01J 37/075 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/067 (2013.01); H01J 19/20 (2013.01); H01J 29/485 (2013.01); H01J 19/14 (2013.01); H01J 37/026 (2013.01); H01J 37/075 (2013.01); H01J 37/3171 (2013.01); H01J 2237/06308 (2013.01); H01J 2237/06375 (2013.01);
Abstract
An apparatus and method for producing electrons in a plasma flood gun is disclosed. The apparatus includes an indirectly heated cathode (IHC) which is contained within a pre-fabricated cartridge. This cartridge can be readily replaced in a plasma flood gun. In addition, the use of an IHC reduces the amount of contaminants that are injected into the workpiece or wafer.