The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
May. 23, 2002
Peter E. Maciejowski, Amesbury, MA (US);
Joseph C. Olson, Beverly, MA (US);
Shengwu Chang, Newburyport, MA (US);
Bjorn O. Pedersen, Chelmsford, MA (US);
Leo V. Klos, Jr., Newburyport, MA (US);
Daniel Distaso, Merrimac, MA (US);
Curt D. Bergeron, Danvers, MA (US);
Peter E. Maciejowski, Amesbury, MA (US);
Joseph C. Olson, Beverly, MA (US);
Shengwu Chang, Newburyport, MA (US);
Bjorn O. Pedersen, Chelmsford, MA (US);
Leo V. Klos, Jr., Newburyport, MA (US);
Daniel Distaso, Merrimac, MA (US);
Curt D. Bergeron, Danvers, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
An indirectly heated cathode ion source includes an arc chamber housing that defines an arc chamber, an indirectly heated cathode and a filament for heating the cathode. The cathode may include an emitting portion having a front surface, a rear surface and a periphery, a support rod attached to the rear surface of the emitting portion, and a skirt extending from the periphery of the emitting portion. A cathode assembly may include the cathode, a filament and a clamp assembly for mounting the cathode and the filament in a fixed spatial relationship and for conducting electrical energy to the cathode and the filament. The filament is positioned in a cavity defined by the emitting portion and the skirt of the cathode. The ion source may include a shield for inhibiting escape of electrons and plasma from a region outside the arc chamber in proximity to the filament and the cathode.