Lawrence Mh Lui

Title: Innovations of Lawrence Mh Lui

Introduction

Lawrence Mh Lui is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of microelectronics, particularly in the dual damascene etching process. With a total of 3 patents to his name, his work has had a substantial impact on semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Underlayer protection for the dual damascene etching." This invention focuses on a method of protecting an underlying diffusion barrier layer during the dual damascene trench and via etch process. The process begins with via hole etching in an intermetal dielectric (IMD) layer, followed by the deposition and patterning of a thin film barrier layer. A key step involves applying a coating of negative photoresist, which is exposed and developed to partially fill the via openings. This thick layer of negative photoresist serves to protect the thin diffusion barrier layer from subsequent etch processing.

Another notable patent is the "Method for forming a dual damascene aperture while employing a peripherally localized intermediate etch stop layer." This method incorporates an etch stop layer situated between a first dielectric layer and a second dielectric layer within a non-active product region of a substrate. The endpoint for forming a trench within the active product region is detected by reaching the etch stop layer while forming a dummy trench in the non-active product region.

Career Highlights

Lawrence Mh Lui is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in dual damascene processes has positioned him as a valuable asset to the company.

Collaborations

Throughout his career, Lawrence has collaborated with notable colleagues, including Chia-Shia Tsai and Mei-Hui Sung. Their combined efforts have contributed to advancements in microelectronic fabrication techniques.

Conclusion

Lawrence Mh Lui's innovative work in the field of microelectronics, particularly in dual damascene etching, showcases his expertise and dedication to advancing semiconductor technology. His contributions continue to influence the industry and pave the way for future innovations.