Company Filing History:
Years Active: 2002-2011
Title: The Innovative Contributions of Kyoko Izuha
Introduction
Kyoko Izuha is a prominent inventor based in Yokohama, Japan, known for her significant contributions to the field of semiconductor technology. With an impressive portfolio of 16 patents, she has made a lasting impact on various innovative processes and methodologies.
Latest Patents
Izuha's recent inventions showcase her expertise in pattern verification and semiconductor device manufacturing. One notable patent describes a "Method and system for correcting a mask pattern design." This method includes preparing both a desired pattern and a mask pattern for forming it on a substrate, along with defining evaluation points and process parameters. The statistics generated from the positional displacements provide essential information to modify the mask pattern efficiently.
Another groundbreaking patent involves the "Method of determining a photo mask," which includes determining the applicability of a photo mask to a second exposure apparatus based on predicted processed patterns under various exposure conditions. The methodology enhances the efficiency of semiconductor device manufacturing processes.
Career Highlights
Izuha has developed her career at Kabushiki Kaisha Toshiba, where she has worked on numerous cutting-edge projects that focus on advancing semiconductor technologies. Her extensive research and innovative mindset have led her to be recognized as a leader in this specialized field.
Collaborations
Throughout her career, Izuha has collaborated with esteemed colleagues such as Toshiya Kotani and Satoshi Tanaka. These partnerships have played a significant role in the development and success of many of her inventions, blending their expertise to push the boundaries of technology in the semiconductor industry.
Conclusion
Kyoko Izuha stands out as an influential figure in the world of innovations and patents, particularly in the semiconductor sector. Her dedication to research and development, combined with her collaborative spirit, continues to inspire future generations of inventors. As she moves forward, her contributions will undoubtedly pave the way for further advancements in technology.