The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Dec. 16, 2004
Toshiya Kotani, Machida, JP;
Shigeki Nojima, Yokohama, JP;
Suigen Kyoh, Yokohama, JP;
Kyoko Izuha, Yokohama, JP;
Ryuji Ogawa, Yokohama, JP;
Satoshi Tanaka, Kawasaki, JP;
Soichi Inoue, Yokohama, JP;
Hirotaka Ichikawa, Yokohama, JP;
Toshiya Kotani, Machida, JP;
Shigeki Nojima, Yokohama, JP;
Suigen Kyoh, Yokohama, JP;
Kyoko Izuha, Yokohama, JP;
Ryuji Ogawa, Yokohama, JP;
Satoshi Tanaka, Kawasaki, JP;
Soichi Inoue, Yokohama, JP;
Hirotaka Ichikawa, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
There is disclosed a method of producing a design layout by optimizing at least one of design rule, process proximity correction parameter and process parameter, including calculating a processed pattern shape based on a design layout and a process parameter, extracting a dangerous spot having an evaluation value with respect to the processed pattern shape, which does not satisfy a predetermined tolerance, generating a repair guideline of the design layout based on a pattern included in the dangerous spot, and repairing that portion of the design layout which corresponds to the dangerous spot based on the repair guideline.