This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2013-2017.
Company Filing History:
Years Active: 2013-2017
Title: Kunio Miyauchi: Innovator in Particle Monitoring Technology
Introduction
Kunio Miyauchi is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of particle monitoring technology, holding a total of 3 patents. His work focuses on methods and systems that enhance the monitoring of particles in various environments.
Latest Patents
Miyauchi's latest patents include a particle monitoring method and a particle monitoring system. The particle monitoring method involves monitoring particles in exhaust gas from a depressurized processing vessel. This method includes counting the particles while cleaning the inside of the vessel, creating a histogram to show the time and number of particles, and extracting feature amounts that indicate correlations between particle modes and counting periods.
Another significant patent is the particle distribution analysis method for a computer-readable storage medium. This method supports particle distribution analysis for substrates by creating histogram data of inter-particle distances. It compares the target substrate's data with multiple virtual substrates to quantify differences and display determination data on a display unit.
Career Highlights
Kunio Miyauchi is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His innovative work has contributed to advancements in particle monitoring technologies, which are crucial for maintaining clean environments in various industrial applications.
Collaborations
Miyauchi has collaborated with notable coworkers, including Tsuyoshi Moriya and Eiichi Nishimura. Their combined expertise has furthered the development of effective monitoring systems and methods.
Conclusion
Kunio Miyauchi's contributions to particle monitoring technology demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of particle dynamics and their implications in industrial processes.