The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Mar. 10, 2010
Hidefumi Matsui, Nirasaki, JP;
Tsuyoshi Moriya, Tokyo, JP;
Eiichi Nishimura, Nirasaki, JP;
Shinichi Kawaguchi, Nirasaki, JP;
Jun Yamawaku, Nirasaki, JP;
Kunio Miyauchi, Nirasaki, JP;
Hidefumi Matsui, Nirasaki, JP;
Tsuyoshi Moriya, Tokyo, JP;
Eiichi Nishimura, Nirasaki, JP;
Shinichi Kawaguchi, Nirasaki, JP;
Jun Yamawaku, Nirasaki, JP;
Kunio Miyauchi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate.