Company Filing History:
Years Active: 1992-2000
Title: Kuniko Miyakawa: A Trailblazer in Titanium Silicide Innovations
Introduction
Kuniko Miyakawa, an accomplished inventor based in Tokyo, Japan, has made significant strides in the field of materials science with a remarkable portfolio of ten patents. Her innovative work primarily focuses on advanced semiconductor materials, specifically pertaining to titanium silicide compounds.
Latest Patents
Among her latest patents are notable contributions to the development of C49-structured tungsten-containing titanium salicide structures. One of her key inventions details a method of forming a C49-structured titanium silicide film that includes a refractory metal with a higher melting point than titanium, introduced as a substitutional solid solution. The specific concentration of this refractory metal ranges from above 1 atomic percent to not less than 20 atomic percent, allowing for enhanced structural properties. This methodology begins with the formation of a titanium film on silicon, followed by heat treatment in an inert gas atmosphere to induce a silicidation reaction, ultimately leading to the desired titanium silicide film.
Career Highlights
Kuniko Miyakawa is currently employed at NEC Corporation, a leading technology company renowned for its innovations in electronics and communications. Her expertise and contributions in the field have positioned her as a key player in advancing semiconductor technology, reinforcing NEC's commitment to pioneering research and development in electronic materials.
Collaborations
Throughout her career, Kuniko has worked alongside notable colleagues, including Kunihiro Fujii and Ken Inoue. This collaboration fosters a dynamic research environment, allowing for the exchange of innovative ideas and fostering creativity in their respective projects.
Conclusion
Kuniko Miyakawa's contributions to the field of materials science, particularly in titanium silicide advancements, highlight her status as a distinguished inventor. With her valuable patents and collaborative spirit at NEC Corporation, she continues to inspire future generations of inventors and researchers alike. Her dedication to innovation is vital to the ongoing evolution of semiconductor technologies.