Gyeonggi-do, South Korea

Kun Hee Park

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: K. C. Tech Co., Ltd.. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kun Hee Park. Retrieved from https://idiyas.com/inventor/kun-hee-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 5.1

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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3 patents (USPTO):Explore Patents

Title: Kun Hee Park: Innovator in Cleaning Technologies

Introduction

Kun Hee Park is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of cleaning technologies, holding a total of 3 patents. His work focuses on compositions and methods that enhance cleaning efficiency.

Latest Patents

Among his latest patents, one is titled "Composition for dissolving abrasive particles and cleaning method using the same." This invention provides a composition that includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent. The turbidity change rate measured at 60° C. for 15 minutes may range from −80 to −99. Another significant patent is "Cleaning liquid composition and cleaning method using same." This patent describes a polishing slurry composition that includes a chelating agent containing an organic salt and an anionic surfactant.

Career Highlights

Kun Hee Park is associated with K. C. Tech Co., Ltd., where he applies his expertise in developing innovative cleaning solutions. His work has been instrumental in advancing the effectiveness of cleaning products in various applications.

Collaborations

He has collaborated with notable coworkers, including Yong Ho Jeong and Kyong Jin Jung, contributing to the development of advanced cleaning technologies.

Conclusion

Kun Hee Park's innovative work in cleaning technologies has led to the development of effective solutions that address industry needs. His contributions continue to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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