The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2023
Filed:
Jul. 21, 2021
Applicant:
Kctech Co., Ltd., Gyeonggi-do, KR;
Inventors:
Kun Hee Park, Gyeonggi-do, KR;
Yong Ho Jeong, Gyeonggi-do, KR;
Kyong Jin Jung, Gyeonggi-do, KR;
Young Ho Yun, Gyeonggi-do, KR;
Assignee:
KCTECH CO., LTD., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 3/24 (2006.01); C11D 3/00 (2006.01); C11D 1/40 (2006.01); H01L 21/304 (2006.01); C11D 11/00 (2006.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01); C11D 3/37 (2006.01);
U.S. Cl.
CPC ...
C11D 3/245 (2013.01); C11D 1/40 (2013.01); C11D 3/0047 (2013.01); C11D 3/3773 (2013.01); C11D 11/0047 (2013.01); H01L 21/304 (2013.01); H01L 21/306 (2013.01); H01L 21/3212 (2013.01);
Abstract
A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.