The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2023
Filed:
Aug. 07, 2019
Applicant:
Kctech Co., Ltd., Gyeonggi-do, KR;
Inventors:
Ga Young Jung, Gwangju, KR;
Yong Ho Jeong, Busan, KR;
Kun Hee Park, Gyeonggi-do, KR;
Young Gon Kim, Busan, KR;
Young Ho Yoon, Gyeonggi-do, KR;
Young Lok Yoon, Gyeonggi-do, KR;
Assignee:
KCTECH CO., LTD., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/37 (2006.01); C11D 3/20 (2006.01); C11D 1/14 (2006.01); C11D 1/34 (2006.01); C11D 3/34 (2006.01); C11D 3/36 (2006.01); C11D 11/00 (2006.01);
U.S. Cl.
CPC ...
C11D 3/2075 (2013.01); C11D 1/146 (2013.01); C11D 1/345 (2013.01); C11D 3/2093 (2013.01); C11D 3/3409 (2013.01); C11D 3/36 (2013.01); C11D 11/0047 (2013.01);
Abstract
The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.