Kun-ei Chen

Title: Kun-ei Chen: Innovator in Semiconductor Technology

Introduction

Kun-ei Chen is a prominent inventor based in Tainan County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative manufacturing methods and structures that enhance semiconductor performance.

Latest Patents

One of Kun-ei Chen's latest patents is titled "Manufacturing method of semiconductor structure and semiconductor structure thereof." This patent describes a semiconductor structure that includes an interconnection structure, a first conductive pad, a second conductive pad, a conductive material, and a conductive coil. The design ensures that the first and second conductive pads are individually connected to the interconnection structure, while the conductive material remains electrically isolated. The conductive coil is strategically placed within the interconnection structure, providing improved functionality.

Another notable patent is the "Method for manufacturing through vias using amorphization to adjust etching rate." This method outlines a process that involves forming a first layer over different regions of a substrate, followed by a series of etching and amorphization steps. The innovative approach allows for a controlled etching rate, enhancing the manufacturing process of semiconductor structures.

Career Highlights

Kun-ei Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative mindset have contributed to the company's advancements in semiconductor technology.

Collaborations

Throughout his career, Kun-ei Chen has collaborated with notable colleagues, including Chen-Chieh Chiang and Ling-Sung Wang. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Kun-ei Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods and structures continue to shape the future of semiconductor manufacturing.