Kun-Bae Noh

Title: Kun-Bae Noh: Innovator in Silica Layer Technology

Introduction

Kun-Bae Noh is a prominent inventor based in Uiwang-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of silica layers and photosensitive resin compositions. With a total of seven patents to his name, Noh's work has had a considerable impact on electronic device manufacturing.

Latest Patents

Noh's latest patents include a composition for forming a silica layer, which features a silicon-containing polymer with a specific weight average molecular weight and polydispersity index. This innovation also encompasses a silica layer manufactured using this composition and an electronic device that incorporates the silica layer. Another notable patent is for a positive photosensitive resin composition, which includes various components such as an alkali soluble resin and photosensitive diazoquinone compound. This composition is crucial for creating photosensitive resin films and display devices.

Career Highlights

Throughout his career, Kun-Bae Noh has worked with leading companies in the industry, including Cheil Industries Inc. and Samsung SDI Co., Inc. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking innovations in electronic materials.

Collaborations

Noh has collaborated with notable colleagues, including Jong-Hwa Lee and Ji-Yun Kwon. These partnerships have fostered a collaborative environment that has led to the advancement of technology in their respective fields.

Conclusion

Kun-Bae Noh's contributions to the field of materials science, particularly in silica layer technology and photosensitive resin compositions, highlight his role as an influential inventor. His patents and collaborations continue to shape the future of electronic devices.