The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Sep. 05, 2012
Eun-kyung Yoon, Uiwang-si, KR;
Eun-ha Hwang, Uiwang-si, KR;
Jong-hwa Lee, Uiwang-si, KR;
Ji-yun Kwon, Uiwang-si, KR;
Dae-yun Kim, Uiwang-si, KR;
Sang-kyeon Kim, Uiwang-si, KR;
Sang-kyun Kim, Uiwang-si, KR;
Sang-soo Kim, Uiwang-si, KR;
Kun-bae Noh, Uiwang-si, KR;
Jun-ho Lee, Uiwang-si, KR;
Jin-young Lee, Uiwang-si, KR;
Hyun-yong Cho, Uiwang-si, KR;
Chung-beom Hong, Uiwang-si, KR;
Eun-Kyung Yoon, Uiwang-si, KR;
Eun-Ha Hwang, Uiwang-si, KR;
Jong-Hwa Lee, Uiwang-si, KR;
Ji-Yun Kwon, Uiwang-si, KR;
Dae-Yun Kim, Uiwang-si, KR;
Sang-Kyeon Kim, Uiwang-si, KR;
Sang-Kyun Kim, Uiwang-si, KR;
Sang-Soo Kim, Uiwang-si, KR;
Kun-Bae Noh, Uiwang-si, KR;
Jun-Ho Lee, Uiwang-si, KR;
Jin-Young Lee, Uiwang-si, KR;
Hyun-Yong Cho, Uiwang-si, KR;
Chung-Beom Hong, Uiwang-si, KR;
Cheil Industries Inc., Gumi-si, KR;
Abstract
Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.