The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

May. 21, 2014
Applicant:

Cheil Industries Inc., Gumi-si, KR;

Inventors:

Ji-Yun Kwon, Uiwang-si, KR;

Jin-Hee Kang, Uiwang-si, KR;

Dae-Yun Kim, Uiwang-si, KR;

Sang-Kyeon Kim, Uiwang-si, KR;

Sang-Soo Kim, Uiwang-si, KR;

Yong-Tae Kim, Uiwang-si, KR;

Kun-Bae Noh, Uiwang-si, KR;

Eun-Bi Park, Uiwang-si, KR;

Jae-Yeol Baek, Uiwang-si, KR;

Jae-Hwan Song, Uiwang-si, KR;

Eun-Kyoung Youn, Uiwang-si, KR;

Bum-Jin Lee, Uiwang-si, KR;

Jong-Hwa Lee, Uiwang-si, KR;

Jin-Young Lee, Uiwang-si, KR;

Chung-Beum Hong, Uiwang-si, KR;

Eun-Ha Hwang, Uiwang-si, KR;

In-Chul Hwang, Uiwang-si, KR;

Assignee:

Cheil Industries Inc., Gumi-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/022 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0226 (2013.01); G03F 7/0045 (2013.01); G03F 7/0233 (2013.01); G03F 7/0755 (2013.01);
Abstract

Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.


Find Patent Forward Citations

Loading…