Hsinchu, Taiwan

Kuen-Chyr Lee

This inventor holds 6 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2004-2007.


% Patents Active = 33.3

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Hsin-chu, TW (2004 - 2006)
  • Tainan, TW (2006 - 2007)

Company Filing History:


Years Active: 2004-2007

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6 patents (USPTO):Explore Patents

Title: Kuen-Chyr Lee: Innovator in Semiconductor Technology

Introduction

Kuen-Chyr Lee is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on improving the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is a method for producing low defect density strained-Si channel MOSFETs. This innovative method enhances wafer throughput and reduces defect density by utilizing a series of epitaxial growth steps involving various silicon deposition precursors. Another notable patent involves a method for improving the electrical continuity of a silicon-germanium film across a silicon/oxide/polysilicon surface. This method employs a novel two-temperature process to create a high-quality silicon-germanium layer, which is crucial for the performance of heterojunction bipolar transistors.

Career Highlights

Kuen-Chyr Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His expertise in the field has led to advancements that benefit the industry as a whole.

Collaborations

Throughout his career, Kuen-Chyr Lee has collaborated with notable colleagues, including Liang-Gi Yao and Shih-Chang Chen. These partnerships have fostered innovation and contributed to the success of various projects.

Conclusion

Kuen-Chyr Lee's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in the industry, making a lasting impact on technology.

Profile summary based on public USPTO records.
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