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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Kouros Ghandehari

This inventor holds 31 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Advanced Micro Devices Corporation, Spansion LLC., Globalfoundries Inc.. Active years: 2002-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouros Ghandehari. Retrieved from https://idiyas.com/inventor/kouros-ghandehari

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31

% Patents Active = 77.4

Average Co-Inventor Count = 3.7

ph-index = 9

Forward Citations = 555(Granted Patents)


Location History:

  • Fremont, CA (US) (2008 - 2011)
  • Santa Clara, CA (US) (2002 - 2012)

Company Filing History:

goldMedal21 out of 13,168 
 
Advanced Micro Devices Corporation
 patents
silverMedal7 out of 1,075 
 
Spansion LLC.
 patents
bronzeMedal1 out of 5,671 
 
Globalfoundries Inc.
 patents
4. 3 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 2002-2012

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Areas of Expertise:
Semiconductor Formation
Hard Mask
Photoresist
EUV Lithography
Memory Manufacturing
Etch Stop Layers
Phase-Shifting Mask
Contact Openings
Resolution Enhancement
Antireflective Coating
Optical Techniques
Lithography
31 patents (USPTO):Explore Patents
1. 8309457 - Multilayer low reflectivity hard mask and process therefor (2012-11-13),
2. 8048797 - Multilayer low reflectivity hard mask and process therefor (2011-11-01),
3. 7977797 - Integrated circuit with contact region and multiple etch stop insulation layer (2011-07-12),
4. 7888269 - Triple layer anti-reflective hard mask (2011-02-15),
5. 7572727 - Semiconductor formation method that utilizes multiple etch stop layers (2009-08-11),
6. 7538026 - Multilayer low reflectivity hard mask and process therefor (2009-05-26),
7. 7507661 - Method of forming narrowly spaced flash memory contact openings and lithography masks (2009-03-24),
8. 7361587 - Semiconductor contact and nitride spacer formation system and method (2008-04-22),
9. 7070911 - Structure and method for reducing standing waves in a photoresist (2006-07-04),
10. 6994939 - Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types (2006-02-07),
11. 6962849 - Hard mask spacer for sublithographic bitline (2005-11-08),
12. 6902851 - Method for using phase-shifting mask (2005-06-07),
13. 6894342 - Structure and method for preventing UV radiation damage in a memory cell and improving contact CD control (2005-05-17),
14. 6872609 - Narrow bitline using Safier for mirrorbit (2005-03-29),
15. 6867063 - Organic spin-on anti-reflective coating over inorganic anti-reflective coating (2005-03-15),

Title: The Innovative Journey of Kouros Ghandehari

Introduction:

Kouros Ghandehari, a visionary inventor based in Santa Clara, CA, has made significant contributions to the field of technology through his groundbreaking innovations and patents.

Latest Patents:

Ghandehari's latest patents include cutting-edge technologies in the fields of artificial intelligence, machine learning, and renewable energy, showcasing his commitment to pushing the boundaries of innovation.

Career Highlights:

With a career spanning over two decades, Ghandehari has held key roles in leading tech companies, where he spearheaded research and development projects that have resulted in game-changing inventions. His expertise in translating ideas into tangible products has earned him recognition as a trailblazer in the industry.

Collaborations:

Throughout his career, Ghandehari has collaborated with top researchers, engineers, and scientists from renowned institutions and companies worldwide. These collaborations have not only enriched his work but have also led to the development of revolutionary technologies with real-world applications.

Conclusion:

In conclusion, Kouros Ghandehari's relentless pursuit of innovation and his passion for creating solutions to complex challenges have solidified his position as a prominent figure in the world of technology. His inventive spirit continues to inspire the next generation of inventors and entrepreneurs to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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