The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Jan. 16, 2002
Applicants:
Carl P. Babcock, Campbell, CA (US);
Kouros Ghandehari, Santa Clara, CA (US);
Inventors:
Carl P. Babcock, Campbell, CA (US);
Kouros Ghandehari, Santa Clara, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ; G03C005/00 ;
U.S. Cl.
CPC ...
Abstract
A phase-shifting mask for a photolithographic process includes a transparent material having first and second trenches. The first trench has a first depth and the second trench has a second depth deeper than the first depth. The phase-shifting mask is suitable for testing the effect of lights of two wavelengths on a layer of photoresist.
Babcock, Carl. (2005). Method for using phase-shifting mask (U.S. Patent No. 6902851). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6902851
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile