Yokohama, Japan

Kosuke Takai

USPTO Granted Patents = 5 

Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Yokohama, JP (2011 - 2016)
  • Kanagawa-ken, JP (2014 - 2016)

Company Filing History:


Years Active: 2011-2016

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5 patents (USPTO):Explore Patents

Title: Kosuke Takai: Innovator in Reflective Mask Technology

Introduction

Kosuke Takai is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of reflective masks. With a total of 5 patents to his name, Takai's work has advanced the technology used in photomasks, which are essential for the production of integrated circuits.

Latest Patents

Takai's latest patents include a method for manufacturing reflective masks and an apparatus for manufacturing reflective masks. One embodiment of his method involves forming a reflection layer on a major surface of a substrate, followed by the creation of an absorption layer on the reflection layer. The method also includes forming a pattern region in the absorption layer and a light-blocking region surrounding this pattern. The light-blocking region is formed by etching the reflection layer using a gas containing chlorine and oxygen. Another notable patent is for a light-reflective photomask that includes a circuit pattern area and an outside area. This photomask features a substrate, a low-reflectivity layer, and a multilayer reflection layer, all designed to optimize performance for deep ultraviolet light.

Career Highlights

Throughout his career, Takai has worked with notable companies such as Kabushiki Kaisha Toshiba and Shibaura Mechatronics Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the semiconductor industry.

Collaborations

Takai has collaborated with esteemed colleagues, including Tomoaki Yoshimori and Makoto Karyu. These partnerships have fostered innovation and have been instrumental in the development of advanced manufacturing techniques.

Conclusion

Kosuke Takai's contributions to reflective mask technology have positioned him as a key figure in the semiconductor manufacturing sector. His innovative patents and collaborations continue to influence the industry, paving the way for future advancements.

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