The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Mar. 17, 2009
Applicant:
Kosuke Takai, Yokohama, JP;
Inventor:
Kosuke Takai, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A light reflecting mask includes a reflecting layer which is provided on a substrate and reflects light, an absorbing layer which is provided on the reflecting layer and absorbs light, a device pattern which is formed in a first region of the absorbing layer, and a reflectance measuring pattern which is formed in a second region of the absorbing layer. The reflectance measuring pattern is a diffraction grating.
Takai, Kosuke. (2011). Light reflecting mask, exposure apparatus, and measuring method (U.S. Patent No. 8007960). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8007960
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile