The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Mar. 03, 2009
Kosuke Takai, Yokohama, JP;
Kosuke Takai, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
To provide a reflection-type mask having a reduced shadowing effect, capable of phase shift exposure and having a shading frame of sufficient shading performance. The mask includes a substrate, a multilayer reflective filmwhich is formed above the substrate, and which reflects exposure light, a first photoabsorber layerwhich is formed above the multilayer reflective film, and which absorbs the exposure light, a circuit pattern regionconstituted, in conformity with a predetermined circuit pattern, of an opening formed as a result of removal of the first photoabsorber layerand an absorbing portion where the first photoabsorber layer remains, and a shading regionhaving a reflectance with respect to the exposure light lower than that in the absorbing portion of the circuit pattern region