The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Mar. 05, 2014
Shibaura Mechatronics Corporation, Yokohama-shi, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Tomoaki Yoshimori, Kanagawa-ken, JP;
Makoto Karyu, Kanagawa-ken, JP;
Takeharu Motokawa, Kanagawa-ken, JP;
Kosuke Takai, Kanagawa-ken, JP;
Yoshihisa Kase, Kanagawa-ken, JP;
SHIBAURA MECHATRONICS CORPORATION, Yokohama-Shi, JP;
KABUSHIKI KAISHA TOPCON, Tokyo, JP;
Abstract
According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.