Kyoto, Japan

Koji Nishiyama

This inventor holds 22 USPTO granted patents and 4 published patent applications, primarily in Substrate Processing. Top assignees: Screen Holdings Co., Ltd., Screen Semiconductor Solutions Co., Ltd., Sokudo Co., Ltd.. Active years: 2010-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koji Nishiyama. Retrieved from https://idiyas.com/inventor/koji-nishiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 90.9

Average Co-Inventor Count = 1.6

ph-index = 4

Forward Citations = 37(Granted Patents)


Location History:

  • Shimogyo-ku, JP (2011)
  • Kyoto, JP (2010 - 2023)

Company Filing History:


Years Active: 2010-2025

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Areas of Expertise:
Substrate Cleaning
Substrate Processing
Substrate Treating
Cleaning Device
Processing Apparatus
Transport Device
Magnetically Controlled
Bevel Inspection
Cleaning Method
22 patents (USPTO):Explore Patents

Title: Innovations by Koji Nishiyama: Pioneering Substrate Cleaning Technologies

Introduction

Koji Nishiyama, a prominent inventor based in Kyoto, Japan, has made significant contributions to the field of substrate processing. With a remarkable portfolio of 21 patents, his work primarily focuses on advanced substrate cleaning devices and methods, which are crucial for various applications in the semiconductor industry.

Latest Patents

Nishiyama's latest innovations include several patents related to substrate cleaning technology. One such invention is a substrate cleaning device that features a rotation holder and a cleaning apparatus. The rotation holder is designed to rotate about an axis and holds the substrate securely, while the cleaner comprises a cleaning tool that effectively removes foreign matter from the substrate's back surface through polishing. Additionally, a mover mechanism aids in positioning the cleaning tool against the substrate during the cleaning process, complemented by a cleaning brush for further refinement.

Another significant patent involves a substrate processing apparatus where a polishing head engages with the substrate's surface while it's rotating on a spin chuck. This innovative setup allows the polishing head to adjust its position between the center and the outer edge, optimizing the cleaning and contamination removal effectiveness based on the radial position of the substrate. The adaptability in the polishing capacity enhances the efficient removal of contaminants while minimizing the risk of damage to the substrate.

Career Highlights

Throughout his career, Koji Nishiyama has been associated with reputable companies in the semiconductor sector. Notably, he has worked with Screen Holdings Co., Ltd. and Screen Semiconductor Solutions Co., Ltd., where he applied his expertise in developing cutting-edge cleaning technologies for substrates.

Collaborations

Nishiyama has collaborated with notable colleagues such as Masahito Kashiyama and Hiroshi Yoshii. These partnerships have allowed for a synergistic approach to innovation, combining different insights and expertise in the development of substrate processing technologies.

Conclusion

Koji Nishiyama's contributions to substrate cleaning technology underscore his significance as an inventor in the field. With his innovative patents and collaborative efforts, he continues to drive advancements that enhance the efficiency and effectiveness of substrate processing in the semiconductor industry. His work not only demonstrates technical ingenuity but also reflects the essential role of inventors in shaping modern manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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