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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11676811 B1

PDFFull Text
Date of Patent:
Jun. 13, 2023

Filed:

Mar. 19, 2021

Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method

Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Koji Nishiyama, Kyoto, JP;

Assignee:

SCREEN Holdings Co., Ltd.;

Attorney:

Ostrolenk Faber LLP

Primary Examiner:

Eric W Golightly

Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 1/00 (2006.01); B08B 11/02 (2006.01); H01L 21/687 (2006.01); B08B 1/02 (2006.01); B08B 3/02 (2006.01); B08B 7/04 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0209 (2013.01); B08B 1/00 (2013.01); B08B 1/002 (2013.01); B08B 1/02 (2013.01); B08B 3/022 (2013.01); B08B 7/04 (2013.01); B08B 11/02 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); H01L 21/68728 (2013.01); H01L 21/68742 (2013.01); H01L 21/68764 (2013.01);
Abstract

A substrate cleaning device that includes a rotation holder and a cleaner. The rotation holder includes a rotator provided to be rotatable about a rotation axis, and a holder provided at the rotator to be capable of holding a substrate. The cleaner includes a cleaning tool provided to be capable of removing foreign matter on a back surface of the substrate by polishing, a mover that moves the cleaning tool while pressing the cleaning tool against the back surface of the substrate held by the holder, and a cleaning brush that further cleans the back surface of the substrate, which has been cleaned or is being cleaned by the cleaning tool.

Find Patent Forward Citations

Nishiyama, Koji. (2023). Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method (U.S. Patent No. 11676811). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11676811

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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