The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Jan. 04, 2017
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Koji Nishiyama, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 1/00 (2006.01); B08B 1/02 (2006.01); B08B 3/02 (2006.01); B08B 7/04 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B08B 11/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0209 (2013.01); B08B 1/00 (2013.01); B08B 1/002 (2013.01); B08B 1/02 (2013.01); B08B 3/022 (2013.01); B08B 7/04 (2013.01); B08B 11/02 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01);
Abstract

A substrate cleaning device includes a rotation holder and a cleaner. The rotation holder includes a rotator provided to be rotatable about a rotation axis, and a plurality of holders provided at the rotator to be capable of abutting against a plurality of portions of an outer peripheral end of a substrate and holding the substrate. The cleaner includes a cleaning tool provided to be capable of removing foreign matter on a back surface of the substrate by polishing, a mover that moves the cleaning tool while pressing the cleaning tool against the back surface of the substrate held by the plurality of holders, and a reaction force generator that generates a reaction force in the substrate against a load applied to the back surface of the substrate by the cleaning tool.


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