Gunma, Japan

Koichi Tanaka

USPTO Granted Patents = 23 

 

Average Co-Inventor Count = 6.0

ph-index = 3

Forward Citations = 33(Granted Patents)


Location History:

  • Annaka, JP (2010)
  • Gunma, JP (2009 - 2015)

Company Filing History:


Years Active: 2009-2015

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23 patents (USPTO):Explore Patents

Title: Koichi Tanaka: Innovating Semiconductor Manufacturing in Gunma, Japan

Introduction

Koichi Tanaka is a prominent inventor based in Gunma, Japan. With an impressive portfolio of 23 patents, he has significantly contributed to the advancement of semiconductor technology and manufacturing processes. His innovative approach has positioned him as a key figure in his field, particularly in enhancing the efficiency and productivity of semiconductor manufacturing.

Latest Patents

Koichi Tanaka's latest inventions showcase his expertise and commitment to innovation. One of his notable patents is a method for reducing the thickness of a Silicon On Insulator (SOI) layer. This patent describes a detailed process that includes implanting hydrogen or rare gas ions into a donor wafer, bonding it to a handle wafer, delaminating the donor wafer at the ion-implanted layer to reduce thickness, and etching the SOI layer to achieve high film thickness uniformity with excellent productivity.

Another patent involves a process for producing a laminated substrate. This method entails forming an oxide film on a first substrate, implanting ions into a second substrate, laminating the two substrates, and ultimately detaching the second substrate to create a laminated structure. These innovations reflect Tanaka’s focus on precision and efficiency in semiconductor manufacturing.

Career Highlights

Koichi Tanaka is currently employed at Shin-Etsu Chemical Co., Ltd., a leading company in the chemical and materials sector. His work at Shin-Etsu leverages his expertise in material science, particularly in the development of advanced semiconductor substrates. His contributions to the field have gained recognition and respect among his peers.

Collaborations

Throughout his career, Tanaka has collaborated with esteemed colleagues such as Shoji Akiyama and Atsuo Ito. These partnerships have not only enhanced his work but also fostered further innovations within the field of semiconductor technology. Collaborative efforts are essential in research and development, enabling the sharing of ideas and resources for greater advancements.

Conclusion

Koichi Tanaka’s remarkable achievements and continuous innovation within the field of semiconductor manufacturing underscore his role as a leading inventor. His patents reflect a deep understanding of materials and processes that drive the industry forward. As technology continues to evolve, Tanaka’s contributions will undoubtedly influence the future of semiconductor manufacturing and related fields, solidifying his legacy as a visionary in the industry.

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