Location History:
- Yamanashi, JP (2014)
- Nirasaki, JP (2016 - 2024)
Company Filing History:
Years Active: 2014-2025
Title: Kohichi Satoh: A Visionary in Deposition Technologies
Introduction
Kohichi Satoh is an innovative inventor based in Nirasaki, Japan, recognized for his contributions to deposition methods and apparatuses. With a remarkable portfolio of nine patents, he has significantly advanced the field of semiconductor manufacturing and materials processing.
Latest Patents
His latest patents demonstrate his expertise and innovation in the deposition process. One of his key inventions is a deposition method and apparatus designed to enhance the efficiency of depositing ruthenium films. This apparatus includes a source line for Ru(CO) from a raw material container, a CO gas line, and a bypass line that optimizes gas flow. The method involves a precise opening of valves to control the delivery of gases, ensuring a controlled environment for the substrate processing.
Another significant patent he holds is a substrate processing method and apparatus. This invention allows for the formation of a ruthenium film on substrates by employing a cyclical process that alternates between supplying and exhausting gases within the processing container. This method not only improves the quality of the film but also increases the efficiency of the production process.
Career Highlights
Kohichi Satoh currently works at Tokyo Electron Limited, a leader in manufacturing and designing semiconductor production equipment. His role in the company highlights his commitment to pushing the boundaries of technology and innovation in the electronics industry.
Collaborations
Throughout his career, Kohichi has worked alongside talented engineers and scientists, including his esteemed colleagues Motoko Nakagomi and Tadahiro Ishizaka. Their collaboration has fostered a creative environment that has led to significant advancements in their field.
Conclusion
Kohichi Satoh stands out as an influential inventor whose work has played a crucial role in the evolution of deposition technologies. His patents continue to impact the semiconductor industry, reflecting his dedication to innovation and excellence. With every advance in his research, he paves the way for future developments in electronic materials processing.