The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Jun. 23, 2021
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/16 (2006.01); C23C 16/44 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/16 (2013.01); C23C 16/4401 (2013.01); C23C 16/4481 (2013.01); C23C 16/45561 (2013.01);
Abstract
A deposition method performed using a deposition apparatus is provided. The deposition apparatus includes: a source line configured to supply Ru(CO)contained in a raw material container into a chamber; a CO gas line configured to supply a CO gas into the raw material container; a bypass line connecting the source line and the CO gas line, and forming a line that does not pass through the raw material container; and a first valve connected to the source line. The deposition method includes: opening the first valve to supply Ru(CO)and the CO gas from the raw material container through the source line;