The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Nov. 16, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Kohichi Satoh, Nirasaki, JP;
Hideaki Yamasaki, Nirasaki, JP;
Motoko Nakagomi, Nirasaki, JP;
Junya Oka, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); C23C 16/458 (2006.01); H01J 37/32 (2006.01); C23C 16/505 (2006.01); C23C 16/08 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4581 (2013.01); H01J 37/32715 (2013.01); H01L 21/68735 (2013.01); H01L 21/68757 (2013.01); C23C 16/08 (2013.01); C23C 16/505 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3328 (2013.01); H01L 21/28568 (2013.01);
Abstract
There is provided a substrate mounting table for use in a plasma-based processing apparatus that performs a plasma-based process on a substrate inside a processing container, which includes a substrate mounting portion having a front surface subjected to a mirroring treatment and on which the substrate is mounted, and an edge portion located around the substrate mounting portion and treated to have an uneven shape.