This inventor holds 4 USPTO granted patents. Top assignees: International Business Machines Corporation, Kabushiki Kaisha Toshiba, Siemens Aktiengesellschaft. Active years: 1997-2001.
Company Filing History:
3 out of 166,159 
2 out of 53,211 
2 out of 30,294 
Years Active: 1997-2001
Title: Klaus B Roithner: Innovator in Gas Distribution Technology
Introduction
Klaus B Roithner is a notable inventor based in Wappingers Falls, NY (US), recognized for his contributions to the field of gas distribution technology. With a total of 4 patents, Roithner has made significant advancements that enhance the efficiency of chemical vapor deposition and etching processes.
Latest Patents
One of Roithner's latest patents is a "Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops." This invention addresses the challenge of non-uniformity in vapor deposition and etching at the edges of wafers caused by gas depletion. The apparatus features a gas distribution plate with multiple apertures, ensuring a uniform rate of chemical vapor deposition or etching across the substrate surface. Another significant patent is the "Pad stack with a poly SI etch stop for TEOS mask removal with RIE." This method allows for the removal of a TEOS etch mask layer using an anisotropic technique, resulting in less undercutting of the pad oxide layer compared to traditional wet chemical etching techniques.
Career Highlights
Throughout his career, Klaus B Roithner has worked with prominent companies such as IBM and Kabushiki Kaisha Toshiba. His experience in these organizations has contributed to his expertise in the field of semiconductor manufacturing and gas distribution technologies.
Collaborations
Roithner has collaborated with notable professionals in the industry, including Karl Paul Muller and Bernhard Poschenrieder. These collaborations have further enriched his work and innovations in gas distribution technology.
Conclusion
Klaus B Roithner's contributions to the field of gas distribution technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the efficiency of chemical processes in the semiconductor industry.