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For the Inventor, By the Inventor

Nara, Japan

Kiyotaka Wasa

This inventor holds 9 USPTO granted patents. Top assignees: Canon Kabushiki Kaisha, Kiyotaka Wasa, Wasa, Kiyotaka. Active years: 2003-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyotaka Wasa. Retrieved from https://idiyas.com/inventor/kiyotaka-wasa-dlap0vx3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9

% Patents Active = 44.4

Average Co-Inventor Count = 4.5

ph-index = 6

Forward Citations = 101(Granted Patents)


Location History:

  • Nara-ken, JP (2003 - 2006)
  • Nara, JP (2006)
  • Chiyogaoka, Nara-shi, Nara-ken, JP (2008)
  • Nara-shi, Nara-ken, JP (2006 - 2009)

Company Filing History:

goldMedal9 out of 93,085 
 
Canon Kabushiki Kaisha
 patents
silverMedal1 out of 1 
 
Kiyotaka Wasa
 patent
bronzeMedal1 out of 1 
 
Wasa, Kiyotaka
 patent
4. 4 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 2003-2009

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9 patents (USPTO):Explore Patents
1. 7618131 - Structure of piezoelectric element and liquid discharge recording head, and method of manufacture therefor (2009-11-17),
2. 7453188 - Dielectric element, piezoelectric element, ink jet head and ink jet recording apparatus and manufacturing method of same (2008-11-18),
3. 7301261 - Dielectric element, piezoelectric element, ink jet head and ink jet recording apparatus and manufacturing method of same (2007-11-27),
4. 7120978 - Process of manufacturing a piezoelectric element (2006-10-17),
5. 7069631 - Method for manufacturing a liquid ejecting head (2006-07-04),
6. 7053526 - Piezoelectric structure, liquid ejecting head and manufacturing method therefor (2006-05-30),
7. 7045935 - Actuator and liquid discharge head, and method for manufacturing liquid discharge head (2006-05-16),
8. 6841490 - Semiconductor substrate, SOI substrate and manufacturing method therefor (2005-01-11),
9. 6653211 - Semiconductor substrate, SOI substrate and manufacturing method therefor (2003-11-25),

Title: Kiyotaka Wasa: Innovator in Piezoelectric Technology

Introduction

Kiyotaka Wasa is a prominent inventor based in Nara-ken, Japan. He has made significant contributions to the field of piezoelectric technology, holding a total of 9 patents. His work focuses on enhancing the efficiency and reliability of microprocessing through innovative designs and manufacturing methods.

Latest Patents

Wasa's latest patents include a structure of a piezoelectric element and a liquid discharge recording head, along with the method of manufacture for these components. The piezoelectric element structure features a supporting substrate and a piezoelectric film that contains a first layer and a second layer with zirconium. These layers are designed to be in contact or laminated through an intermediate layer, with the temperature set at 500°C or more during thin film formation. This process allows for a quick cooling from the thin film formation temperature to at least 450°C at a cooling speed of 30°C/min or more. The resulting piezoelectric film is thinner than conventional films but exhibits a larger piezoelectric constant, enabling efficient microprocessing. Additionally, he has developed a dielectric element that includes a lower electrode layer, a dielectric layer, and an upper electrode layer, with specific compositions to enhance performance.

Career Highlights

Throughout his career, Kiyotaka Wasa has worked with notable companies, including Canon Kabushiki Kaisha. His innovative approaches have led to advancements in the manufacturing of piezoelectric and dielectric elements, contributing to the development of inkjet heads and recording apparatuses.

Collaborations

Wasa has collaborated with esteemed colleagues such as Takanori Matsuda and Tetsuro Fukui. Their combined expertise has further propelled advancements in the technologies they have worked on.

Conclusion

Kiyotaka Wasa's contributions to piezoelectric technology and his innovative patents have significantly impacted the field. His work continues to influence the development of efficient microprocessing techniques and advanced recording technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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