Kiyoshi Hattori

Title: Kiyoshi Hattori: A Pioneer in Electron Beam Technologies

Introduction

Kiyoshi Hattori is a renowned inventor based in Tokyo, Japan, known for his significant contributions to the field of electron beam technologies. With an impressive portfolio of 20 patents, Hattori has established himself as a leading innovator in the industry, advancing methods that enhance precision and efficiency in charged particle beam applications.

Latest Patents

Hattori's recent innovations include two notable patents that reflect his expertise in correcting and optimizing electron beam processes. The first patent, titled "Electron Beam Drift Correction Method and Electron Beam Writing Method," introduces a sophisticated approach to correcting the drift of an electron beam. This method entails periodically adjusting the drift correction based on a specified time period while also responding to changes in disturbance factors that affect performance.

The second patent, "Charged Particle Beam Writing Apparatus and Optical Axis Deviation Correcting Method for Charged Particle Beam," describes an advanced apparatus designed to maintain the integrity of the charged particle beam during writing processes. This system includes a stage for the target object, an emitting unit for the beam, and a deflector that utilizes voltage to control beam direction. The method also involves an optical axis adjusting unit that continually corrects deviations, ensuring high precision during operation.

Career Highlights

Kiyoshi Hattori has held key positions with pioneering companies such as Toshiba Corporation and Nuflare Technology, Inc. At these organizations, he has played a crucial role in developing technologies that influence various applications of charged particle beams, contributing to advancements in electronics manufacturing and materials processing.

Collaborations

Throughout his career, Hattori has had the privilege of working alongside talented colleagues such as Kuniyoshi Marui and Shinya Takahashi. These collaborations have fostered an environment of innovation, enabling the team to push the boundaries of what is possible in electron beam technology.

Conclusion

Kiyoshi Hattori’s dedication to innovation has not only resulted in numerous patents but has also significantly impacted the field of electron beam applications. His work showcases the importance of continuous improvement and adaptation in technology, positioning him as a key figure in the evolution of this critical area of research and development.