The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Jul. 02, 2007
Takuya Matsukawa, Shizuoka, JP;
Shuichiro Fukutome, Shizuoka, JP;
Tomoyuki Horiuchi, Shizuoka, JP;
Hayato Kimura, Shizuoka, JP;
Tateki Watanabe, Shizuoka, JP;
Kiyoshi Hattori, Tokyo, JP;
Takuya Matsukawa, Shizuoka, JP;
Shuichiro Fukutome, Shizuoka, JP;
Tomoyuki Horiuchi, Shizuoka, JP;
Hayato Kimura, Shizuoka, JP;
Tateki Watanabe, Shizuoka, JP;
Kiyoshi Hattori, Tokyo, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordinate values by use of the value of the air pressure measured, a deflection amount computing unit which calculates the deflection amount of a charged particle beam by using the 3D coordinate values corrected, an irradiator for irradiation of the charged particle beam, and a deflector for deflection of the charged particle beam based on the deflection amount.