Kiyohito Ito

Title: Innovations by Kiyohito Ito: A Pioneer in Substrate Processing Technology

Introduction

Kiyohito Ito, an accomplished inventor based in Miyagi, Japan, has made significant contributions to the field of substrate processing technology. With a total of 8 patents to his name, his innovative ideas have propelled advancements in treatments and processing methodologies within the semiconductor industry.

Latest Patents

Among Kiyohito Ito's latest patents is a treatment method that involves embedding an organic film in an undercoat film with a depression formed. The method further includes an etching step that exposes the top of the undercoat film after the embedding process. Additionally, he has developed a processing method and substrate processing apparatus aimed at optimizing pattern formation on a mask layer. This method includes depositing materials on a patterned mask, selectively removing parts of the mask and deposits, and repeating this cycle to achieve a desired taper angle of the side surfaces of patterns formed in the mask layer.

Career Highlights

Currently, Kiyohito Ito is with Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on innovating processes that enhance the efficiency and quality of semiconductor fabrication. His 8 patents reflect his deep understanding and creativity in addressing complex challenges within the field.

Collaborations

Kiyohito Ito has had the privilege of collaborating with esteemed colleagues, including Akiteru Ko and Shinya Morikita. Together, they have worked on pushing the boundaries of technology in substrate processing, contributing to advances that benefit the wider industry.

Conclusion

Kiyohito Ito's inventive spirit and dedication to innovation in substrate processing make him a notable figure in the semiconductor field. His patents not only exemplify his technical expertise but also symbolize the continuous progress of technology, impacting the future landscape of electronics and materials science.