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Kimihiko Nakatani

USPTO Granted Patents = 50 (Patent Applications = 41)

Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 44(Granted Patents)

Forward Citations (Not Self Cited) = 26(Dec 10, 2025)

Location History:

Toyama, JP (2015 - 2024)
Toyoma, JP (2024)

Company Filing History:

Kokusai Electric Corporation

Hitachi-kokusai Electric Inc.

Years Active: 2015-2025

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Areas of Expertise:

Semiconductor Manufacturing

Substrate Processing

Film Formation

Silicon Precursor

Selective Film Formation

Recording Medium

Processing Apparatus

Substrate Processing Apparatus

Non-Transitory Computer-Readable Medium

Silicon-Based Films

Semiconductor Devices

Substrate Processing Systems

50 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12494364 - Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium (2025-12-09),

2. 12494363 - Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus (2025-12-09),

3. 12424463 - Method of processing substrate, method of manufacturing semiconductor device, substrate processing system, and recording medium (2025-09-23),

4. 12400874 - Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium (2025-08-26),

5. 12392031 - Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device (2025-08-19),

6. 12381091 - Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus (2025-08-05),

7. 12374544 - Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium (2025-07-29),

8. 12331393 - Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2025-06-17),

9. 12283478 - Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium (2025-04-21),

10. 12281386 - Method of processing substrate for forming film containing silicon by supplying precursor containing Si—C bonds (2025-04-21),

11. 12278103 - Method of processing substrate and method of manufacturing semiconductor device by forming film (2025-04-14),

12. 12255072 - Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device (2025-03-18),

13. 12243753 - Method and apparatus for selective film formation in semiconductor substrate processing (2025-03-04),

14. 12217959 - Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2025-02-04),

15. 12176216 - Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2024-12-24),

Title: Kimihiko Nakatani - Pioneering Inventor from Toyama, Japan

Introduction: Kimihiko Nakatani is a renowned inventor hailing from Toyama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kimihiko Nakatani holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Nakatani has worked with leading tech companies and research institutions, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Kimihiko Nakatani has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: In conclusion, Kimihiko Nakatani stands as a visionary inventor whose passion for pushing the boundaries of technology has left a lasting impact on the world of innovation.

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