The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Jun. 15, 2023
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Motomu Degai, Toyama, JP;

Kimihiko Nakatani, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 50/28 (2026.01); H10P 14/692 (2026.01); H10P 14/694 (2026.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 50/283 (2026.01); H10P 14/69215 (2026.01); H10P 14/69433 (2026.01); H10P 72/0421 (2026.01);
Abstract

There is provided a technique that includes: performing a cycle a predetermined number of times, the cycle including: (a) forming a first layer on a surface of a first film by supplying a processing agent to a substrate including the first film on a surface of the substrate; and (b) etching the first layer and at least a portion of the first film by supplying an etching agent to the substrate, wherein in (b), when etching the first layer, a substance X that reacts with the etching agent but does not contribute alone to the etching is generated, and the first layer and the at least a portion of the first film are etched by using a mixture of the substance X and the etching agent.


Find Patent Forward Citations

Degai, Motomu. (2026). Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (U.S. Patent No. 12765294). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12765294

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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