Los Gatos, CA, United States of America

Khalid Makhamreh

This inventor holds 25 USPTO granted patents and 4 published patent applications, primarily in Photomask Processing. Top assignees: Applied Materials, Inc., Nanoclean Technologies, Inc., Alliedsignal Inc.. Active years: 2001-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Khalid Makhamreh. Retrieved from https://idiyas.com/inventor/khalid-makhamreh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 72.0

Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 123(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2001 - 2005)
  • Los Gatos, CA (US) (2004 - 2024)

Company Filing History:


Years Active: 2001-2026

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Areas of Expertise:
Atmospheric Pressure Plasma
Ultraviolet Cleaning
Ozone Cleaning
Megasonic Clean
Baking Chamber
Photomask Processing
Resist Stripping
Surface Cleaning
Carbon Dioxide Cleaning
High Throughput Curing
Cavity Property Monitoring
Manufacturing Environment
25 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Khalid Makhamreh in Cleaning Technology**

Introduction

Khalid Makhamreh, based in Los Gatos, California, is a prolific inventor recognized for his significant contributions in cleaning technology. With a remarkable portfolio of 23 patents, he has consistently pushed the boundaries of innovation, specifically in the realm of ultraviolet and ozone cleaning systems.

Latest Patents

Khalid’s latest patents highlight his unique approach to cleaning substrates utilizing advanced methods. One notable patent is the "Ultraviolet and ozone cleaning apparatus and method of using," which describes a cleaning apparatus that contacts substrates with ozonated water while irradiating them with ultraviolet (UV) electromagnetic radiation from a UV lamp inside a cleaning chamber. This invention focuses on ensuring that at least 50% of the UV radiation has a wavelength greater than or equal to about 280 nm. Another of his recent developments, the "Ultraviolet and ozone clean system," includes a sophisticated assembly with a lamp that emits UV radiation in an irradiation region, effectively utilizing the properties of ozonated water to enhance the cleaning process.

Career Highlights

Khalid has made significant strides in his career working with esteemed companies such as Applied Materials, Inc. and Nanoclean Technologies, Inc. His efforts in these organizations have been pivotal in developing technologies that improve cleaning efficiencies across various applications.

Collaborations

Throughout his career, Khalid has had the pleasure of collaborating with skilled professionals such as Banqiu Wu and Adel George Tannous. These partnerships have fostered a creative environment where innovative ideas and technological advancements can flourish.

Conclusion

Khalid Makhamreh's work exemplifies the essence of innovation within the cleaning technology industry. His patents not only reflect his technical expertise but also demonstrate a commitment to creating effective solutions that address real-world cleaning challenges. As the demand for effective cleaning technologies continues to grow, Khalid's contributions will undoubtedly play a critical role in shaping the future of this sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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