The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Nov. 15, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Banqiu Wu, San Jose, CA (US);
Eli Dagan, Sunnyvale, CA (US);
Khalid Makhamreh, Los Gatos, CA (US);
Bruce J. Fender, Kalispell, MT (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/20 (2006.01); G03F 1/66 (2012.01); G03F 7/20 (2006.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
G03F 7/707 (2013.01); G03F 1/66 (2013.01); G03F 7/70741 (2013.01); G03F 1/22 (2013.01); G03F 7/70716 (2013.01);
Abstract
Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.