The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
Nov. 15, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Banqiu Wu, San Jose, CA (US);
Khalid Makhamreh, Los Gatos, CA (US);
Eliyahu Shlomo Dagan, Sunnyvale, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 13/00 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); B08B 7/00 (2006.01); B08B 7/04 (2006.01);
U.S. Cl.
CPC ...
B08B 7/04 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); B08B 7/0057 (2013.01); B08B 13/00 (2013.01); B08B 2203/005 (2013.01);
Abstract
A cleaning apparatus for cleaning a substrate wherein the substrate is contacted with ozonated water and irradiating the substrate and the ozonated water with UV electromagnetic radiation from a UV lamp within a cleaning chamber; wherein greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm. Methods of cleaning a substrate are also presented.