The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Apr. 05, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Banqiu Wu, San Jose, CA (US);
Khalid Makhamreh, Los Gatos, CA (US);
Eliyahu Shlomo Dagan, Sunnyvale, CA (US);
Assignee:
Applied Materials Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 30/20 (2026.01); H10P 95/90 (2026.01);
U.S. Cl.
CPC ...
H10P 30/21 (2026.01); H10P 30/204 (2026.01); H10P 95/90 (2026.01);
Abstract
Methods and apparatus for contacting a substrate with a plasma at a pressure from about 300 Torr to about 1000 Torr for a period of time sufficient to heat a top portion of the substrate having a depth of less than about 200 nm, to a temperature high enough for annealing, and the temperature of the substrate at a depth of greater than or equal to about 200 nm is less than or equal to about 450° C.