Kevin Lally

This inventor holds 10 USPTO granted patents. Top assignees: Tokyo Electron Limited, International Business Machines Corporation. Active years: 2007-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kevin Lally. Retrieved from https://idiyas.com/inventor/kevin-lally

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 60.0

Average Co-Inventor Count = 3.5

ph-index = 5

Forward Citations = 99(Granted Patents)

Company Filing History:

10 out of 10,904

Tokyo Electron Limited

patents

2 out of 166,351

International Business Machines Corporation

patents

where one patent can have more than one assignee

Years Active: 2007-2010

Loading Chart...

10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7801635 - Real-time parameter tuning for etch processes (2010-09-21),

2. 7642102 - Real-time parameter tuning using wafer thickness (2010-01-05),

3. 7623978 - Damage assessment of a wafer using optical metrology (2009-11-24),

4. 7619731 - Measuring a damaged structure formed on a wafer using optical metrology (2009-11-17),

5. 7576851 - Creating a library for measuring a damaged structure formed on a wafer using optical metrology (2009-08-18),

6. 7571074 - Method of using a wafer-thickness-dependant profile library (2009-08-04),

7. 7502660 - Feature dimension deviation correction system, method and program product (2009-03-10),

8. 7477960 - Fault detection and classification (FDC) using a run-to-run controller (2009-01-13),

9. 7324193 - Measuring a damaged structure formed on a wafer using optical metrology (2008-01-29),

10. 7289864 - Feature dimension deviation correction system, method and program product (2007-10-30),

Title: Kevin Lally: Innovator in Real-Time Parameter Tuning

Introduction

Kevin Lally is a prominent inventor based in Austin, TX (US). He has made significant contributions to the field of etch processing, holding a total of 10 patents. His work focuses on enhancing the efficiency and effectiveness of wafer processing through innovative techniques.

Latest Patents

Among his latest patents, Lally has developed methods for real-time parameter tuning in etch processes. One notable invention provides a procedure that utilizes real-time data to adjust etch recipe and profile data dynamically. This method allows for the incorporation of various input messages, including pass-through, feedforward, and optimization messages. Another significant patent involves real-time parameter tuning based on wafer thickness, which similarly employs real-time data to refine measurement and process recipes.

Career Highlights

Lally has had a distinguished career, working with leading companies in the technology sector. He has been associated with Tokyo Electron Limited and IBM, where he has contributed to advancements in semiconductor manufacturing processes. His expertise in real-time parameter tuning has positioned him as a key figure in the industry.

Collaborations

Throughout his career, Lally has collaborated with notable professionals, including Merritt Funk and Radha Sundararajan. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Kevin Lally's contributions to the field of etch processing through his innovative patents and collaborations highlight his role as a leading inventor. His work continues to influence the semiconductor industry, paving the way for future advancements.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]