Location History:
- Nirasaki, JP (2015)
- Miyagi, JP (2015)
- Kurokawa-gun, JP (2019)
Company Filing History:
3 out of 10,326 
1 out of 33 
1 out of 52,735 
Years Active: 2015-2019
Title: Kenta Yasuda: Innovator in Plasma Processing Technologies
Introduction
Kenta Yasuda is a notable inventor based in Kurokawa-gun, Japan. He has made significant contributions to the field of plasma processing, holding a total of 3 patents. His work focuses on advanced methods and apparatuses that enhance substrate processing and cleaning.
Latest Patents
Yasuda's latest patents include a plasma processing method and a plasma processing apparatus. The plasma processing method involves preparing a specialized apparatus that includes a chamber, lower and upper electrodes, a focus ring, and an annular coil. This method allows for the generation of plasma from process gas, which is crucial for various applications in semiconductor manufacturing. Another significant patent is the substrate cleaning apparatus, which features a supporting unit and nozzle units designed to eject gas clusters for effective cleaning of substrates. This innovative approach utilizes a cleaning gas that expands adiabatically to form aggregates of atoms and molecules, ensuring thorough cleaning.
Career Highlights
Throughout his career, Kenta Yasuda has worked with prominent companies such as Tokyo Electron Limited and Iwatani Corporation. His experience in these organizations has allowed him to develop and refine his expertise in plasma processing technologies.
Collaborations
Yasuda has collaborated with notable colleagues, including Akinori Kitamura and Shunsuke Ishida. These partnerships have contributed to the advancement of his research and innovations in the field.
Conclusion
Kenta Yasuda is a distinguished inventor whose work in plasma processing has led to significant advancements in substrate processing technologies. His patents reflect his commitment to innovation and excellence in the field.