The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Sep. 14, 2016
Tokyo Electron Limited, Minato-ku, JP;
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Kenta Yasuda, Kurokawa-gun, JP;
Toru Kubota, Yokkaichi, JP;
Takashi Kondo, Kurokawa-gun, JP;
Katsuhiro Ishida, Yokkaichi, JP;
TOKYO ELECTRON LIMITED, Minato-ku, JP;
KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;
Abstract
A plasma processing method according to an aspect includes: preparing a plasma processing apparatus including: a chamber; a lower electrode; an upper electrode; a focus ring surrounding a peripheral edge of the lower electrode; and an annular coil disposed on an upper portion of the upper electrode at a more outer position than the peripheral edge of the lower electrode; placing a substrate on the lower electrode, with a peripheral edge of the substrate surrounded by the focus ring; introducing process gas into the chamber; generating plasma of the process gas by applying high-frequency power across the upper electrode and the lower electrode; and leveling an interface of a plasma sheath on an upper portion of the substrate with that on an upper portion of the focus ring by generating a magnetic field by supplying a current to the annular coil.