Hong Kong, China

Kenneth Chun Kuen Cheng

Average Co-Inventor Count = 4.2

ph-index = 1

Forward Citations = 1(Granted Patents)

Location History:

  • Hong Kong, CN (2024)
  • Shatin, CN (2024)


Years Active: 2024-2025

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Innovator Spotlight: Kenneth Chun Kuen Cheng - Revolutionizing Semiconductor Devices

Introduction:

Kenneth Chun Kuen Cheng, a brilliant innovator hailing from Hong Kong, CN, has made remarkable contributions to the field of semiconductor technology. With an impressive portfolio of 4 patents, Cheng's groundbreaking work at International Business Machines Corporation (IBM) is setting new standards in the industry.

Latest Patents:

Cheng's latest patents showcase his expertise in semiconductor device fabrication. One patent titled "Top via interconnects without barrier metal between via and above line" introduces a method for fabricating semiconductor devices with high modulus materials and low- dielectrics. Another patent, "BEOL etch stop layer without capacitance penalty," focuses on enhancing etch stop layers in semiconductor structures.

Career Highlights:

Kenneth Chun Kuen Cheng's tenure at IBM has been marked by innovation and excellence. His in-depth knowledge of semiconductor materials and processes has led to the development of cutting-edge technologies that are shaping the future of the industry. Cheng's dedication to pushing the boundaries of what is possible in semiconductor device fabrication sets him apart as a true visionary.

Collaborations:

In his work, Cheng has collaborated closely with esteemed colleagues such as Chanro Park and Koichi Motoyama. Together, they have combined their expertise to tackle complex challenges in semiconductor technology, leading to the successful implementation of novel solutions and the advancement of the field as a whole.

Conclusion:

Kenneth Chun Kuen Cheng's relentless pursuit of innovation and his exceptional contributions to semiconductor technology exemplify the spirit of creativity and progress. His patents and collaborations stand as a testament to his invaluable impact on the industry, and his work continues to inspire future generations of inventors and researchers in the field.

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