Kenji Yokomizo

This inventor holds 11 USPTO granted patents. Top assignees: Tokyo Electron Limited, Tokyo Electron Kyushu Limited. Active years: 1996-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Yokomizo. Retrieved from https://idiyas.com/inventor/kenji-yokomizo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 72.7

Average Co-Inventor Count = 2.0

ph-index = 7

Forward Citations = 161(Granted Patents)

Location History:

Onojo, JP (1996 - 1997)
Dr Round Rock, TX (US) (2001 - 2002)
Round Rock, TX (US) (2003 - 2004)
Scottsdale, AZ (US) (2007)
Austin, TX (US) (1998 - 2012)

Company Filing History:

11 out of 10,904

Tokyo Electron Limited

patents

2 out of 85

Tokyo Electron Kyushu Limited

patents

where one patent can have more than one assignee

Years Active: 1996-2012

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8303723 - Liquid processing apparatus, liquid processing method, and storage medium (2012-11-06),

2. 7678199 - Substrate cleaning method (2010-03-16),

3. 7270137 - Apparatus and method of securing a workpiece during high-pressure processing (2007-09-18),

4. 6780277 - Etching method and etching apparatus (2004-08-24),

5. 6558476 - Substrate processing method (2003-05-06),

6. 6399517 - Etching method and etching apparatus (2002-06-04),

7. 6199564 - Substrate processing method and apparatus (2001-03-13),

8. 5817185 - Method for washing substrates (1998-10-06),

9. 5730162 - Apparatus and method for washing substrates (1998-03-24),

10. 5671544 - Substrate drying apparatus and substrate drying method (1997-09-30),

11. 5575079 - Substrate drying apparatus and substrate drying method (1996-11-19),

Title: Kenji Yokomizo: Innovator in Liquid Processing Technology

Introduction

Kenji Yokomizo is a prominent inventor based in Austin, Texas, known for his significant contributions to liquid processing technology. With a total of 11 patents to his name, Yokomizo has developed innovative solutions that enhance the efficiency and effectiveness of substrate cleaning processes.

Latest Patents

Yokomizo's latest patents include a liquid processing apparatus and a substrate cleaning method. The liquid processing apparatus is designed to remove films from substrates by utilizing a combination of chemical liquids and physical impacts. This innovative approach allows for the effective dissolution and removal of films while minimizing debris. The substrate cleaning method aims to reduce the amount of film fragments discharged into processing liquid circulation systems, thereby decreasing the frequency of filter maintenance.

Career Highlights

Throughout his career, Kenji Yokomizo has worked with leading companies in the semiconductor industry, including Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to refine his expertise in liquid processing technologies and contribute to advancements in the field.

Collaborations

Yokomizo has collaborated with notable professionals in the industry, including Teruomi Minami and Tom Williams. These partnerships have fostered innovation and have played a crucial role in the development of his patented technologies.

Conclusion

Kenji Yokomizo's work in liquid processing technology exemplifies the impact of innovative thinking in the semiconductor industry. His patents reflect a commitment to improving substrate cleaning methods and enhancing overall processing efficiency.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]